thermal processing

We offer a process for annealing large batches of semiconductor substrates in a controlled manner.

As part of the service, it is possible to:

  • annealing in an atmosphere of nitrogen, argon and/or a mixture of nitrogen and hydrogen at temperatures up to 1200 °C
  • process large batches in a reproducible manner in a single process: 25 substrates with a diameter of 200 mm and 50 substrates with a diameter of 100 mm and 150 m

Keywords: annealing, controlled annealing

contact: uslugi.cezamat@pw.edu.pl

Skip to content