pulsed laser deposition

We offer deposition of thin films of oxide materials by Pulsed Laser Deposition. The tool enables the manufacture of single layers or heterostructures and the execution of single processes or short production runs. It is possible to run the process under high vacuum (UHV) or under an oxygen or nitrogen process atmosphere.

Process conditions:

  • laser characteristics: wavelength 248 nm, frequency up to 50 Hz
  • substrate temperature: from room temperature to 1000 °C
  • possibility to use up to 8 different materials in one process
  • possibility to limit the exposure of the produced layers to air

Keywords: pld, thin film deposition, coatings, laser ablation

contact: uslugi.cezamat@pw.edu.pl

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