production of photolithographic masks

We offer the possibility of producing photolithographic masks by electronolithography on our own or supplied substrates.

Mask parameters:

  • mask substrate size 5” or 7”
  • glass or quartz substrates
  • resolution of the fabricated pattern below 300 nm (to be determined depending on the pattern)
  • thickness of chromium layer 100 nm

It is possible to select a different thickness of chromium layer (with or without anti- -reflection layer) and a different substrate material and obtain a higher resolution.

Keywords: photolithography, electronolithography, photolithographic masks, glass substrates, quartz substrates

contact: uslugi.cezamat@pw.edu.pl

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