Production of photolithographic masks
We offer the possibility of producing photolithographic masks by electronolithography on our own or supplied substrates.
Mask parameters:
- mask substrate size 5” or 7”
- glass or quartz substrates
- resolution of the fabricated pattern below 300 nm (to be determined depending on the pattern)
- thickness of chromium layer 100 nm
It is possible to select a different thickness of chromium layer (with or without anti- -reflection layer) and a different substrate material and obtain a higher resolution.
Keywords: photolithography, electronolithography, photolithographic masks, glass substrates, quartz substrates
contact: uslugi.cezamat@pw.edu.pl