production grade chemical cleaning

We offer efficient and reproducible processes for cleaning large batches of silicon substrates and preparing them for further process steps. Processes are performed on 100 mm/4”, 125 mm/5”, 150 mm/6” and 200 mm/8” substrates in batch mode (up to 25 substrates).

The processes include:

  • SPM cleaning at temperatures up to 120 °C,
  • SC1 cleaning at up to 80 °C,
  • SC2 cleaning at up to 80 °C,
  • removal of native SiO2 in dilute HF solution.

Cleaning is carried out in a dry-in/dry-out system.

Keywords: chemical cleaning, production cleaning, substrate cleaning, spm, sc1, sc2, dry-in dry-out, repetitive cleaning

contact: uslugi.cezamat@pw.edu.pl

Skip to content