High-temperature diffusion

We offer the performing of a diffusion process for applications in micro- and nanoelectronics, photonics or photovoltaics and micromechanics.

As part of the service, it is possible to:

  • performing boron diffusion at temperatures up to 1000 °C
  • process large batches in a reproducible manner in a single process: 25 substrates of 200 mm diameter and 50 substrates of 100 mm and 150 mm diameter

Keywords: boron diffusion, high temperature diffusion, diffusion process

contact: uslugi.cezamat@pw.edu.pl

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