Marcin Juchniewicz, PhD Eng.

Research Assistant Professor


Graduated from the Faculty of Chemistry, Warsaw University of Technology. In 2014 he defended his doctoral thesis: "Research and development of microsystems with conductometric detection of ionic composition of the sample". For 6 years he worked at the Institute of Electron Technology where his activity was mainly focused on III-V semiconductor technology. From 2016 to 2019 he was a process and service engineer at Oxford Instruments. Since 2019, he has been an employee of CEZAMAT. His research interests include, but are not limited to, plasma processes in semiconductor technology and the design and construction of microfluidic systems.

Areas of research

  • plasma processes: ICP, RIE, PECVD, ALD, magnetron sputtering
  • microfluidic systems (microfluidics)
  • optical and electrochemical detection in microfluidic systems
  • photolithography

Selected Publications

  1. Pągowska K., Kozubal M., Taube A., Kruszka R., Kamiński M., Kwietniewski N., Juchniewicz M., Szerling A., The interplay between damage- and chemical-induced isolation mechanism in Fe+-implanted AlGaN/GaN HEMT structures, Materials Science in Semiconductor Processing, 127, 2021.
  2. Ekielski, M., Juchniewicz, M., Płuska, M., Wzorek, M., Kamińska, E., Piotrowska, A. Nanometer scale patterning of GaN using nanoimprint lithography and Inductively Coupled Plasma etching (2015) Microelectronic Engineering, 133, pp. 129-133.
  3. Juchniewicz, M., Chudy, M., Brzózka, Z., Dybko, A. Bonding-less (B-less) fabrication of polymeric microsystems (2009) Microfluidics and Nanofluidics, 7 (5), pp. 733-737.
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