consulting services and solution analysis in the field of printed electronics
We offer specialized consulting in the analysis of solutions in the field of printed electronics.
printing on three-dimensional substrates
We offer functional prints on three-dimensional substrates (e.g., spheres, hemispheres, cylindrical substrates) by Aerosol Jet Printing
production 2d/3d bio-prints
We offer 2D/3D bioprints using the Direct Printing Dispenser, Drop-on-Demand, or Fused Deposition Modelling.
transferring technology to an industrial scale
We offer scaling of printing technologies to industrial scale – preparation for implementation into production, including concept testing, digital modeling, and simulation of products, their components, and processes.
development of personalized solutions in the field of printed electronics
We offer the development of printed electronics, flexible electronics, and textronics solutions for the required application.
We test the strength of materials in tension and compression.
tests in a climate chamber
We offer testing in a climate chamber.
testing of rheological properties
We measure the viscosity of non-Newtonian liquids, record liquidity curves, and determine the function of non-Newtonian liquids under sustained flow rate behavior conditions
tests of electrical properties
We measure current, voltage, capacitance, current frequency and resistance (2-wire and 4-wire).
development of materials for printing techniques
We offer preparation of materials for printing techniques for dedicated applications.
technical consulting for technology implementation
The consulting offer includes actions concerning the implementation of technology for the manufacture.
modeling and simulation of new technologies in the field of electronics and photonics
We offer concept testing, modeling, and simulation of structures, instruments, systems, and processes.
We perform complete ellipsometric measurements of samples.
scanning electron microscopy
We offer sample characterization using a high-resolution scanning electron microscope (HRSEM) Auriga 60 from Carl Zeiss
production grade chemical cleaning
We offer efficient and reproducible processes for cleaning large batches of silicon substrates and preparing them for further process steps.
laboratory grade chemical cleaning
We offer cleaning of silicon substrates, quartz substrates and photolithographic masks.
We offer ICP/RIE plasma etching (ICP – Inductively Coupled Plasma, RIE – Reactive Ion Etching)
We offer etching of a variety of substrates and deposited layers using wet-chemical processes.
We offer a process for oxidizing large batches of silicon substrates in a controlled and reproducible manner.
pulsed laser deposition
We offer deposition of thin films of oxide materials by Pulsed Laser Deposition.
lpcvd deposition processes
We offer processes for the chemical vapour deposition of polysilicon and silicon nitride films under reduced pressure (Low Pressure Chemical Vapor Deposition).
We offer Plasma Enhanced Chemical Vapour Deposition (PECVD) for applications including nanoelectronics, photonics, micromechanics, passivation, encapsulation or masking layers
We offer magnetron sputtering for applications including semiconductor electronics, photovoltaics, optoelectronics.
We offer the complete photolithography process, starting with substrate preparation, application of the resist layer, exposure and development, up to hardening (preparation for wet or dry etching).
Electronolithography, or electron-beam lithography, allows patterns to be written directly onto the resist layer, resulting in possible feature dimensions at the level of single nanometers
We offer bonding of substrates manufactured from a variety of materials, including semiconductor materials (silicon and others) and dielectrics (glass, ceramics and others), for use in microelectronics, nanoelectronics, photonics and microsystems
rapid thermal processing (rtp)
We offer rapid thermal annealing processes for silicon substrates with heating rates up to 200 °C/s.
We offer a process for annealing large batches of semiconductor substrates in a controlled manner.
We offer the performing of a diffusion process for applications in micro- and nanoelectronics, photonics or photovoltaics and micromechanics.
We offer an ion implantation process for electronics, optoelectronics, spintronics, among others
production of photolithographic masks
We offer the possibility of producing photolithographic masks by electronolithography on our own or supplied substrates.