Photomask cleaning

AP&S Spin|Step SpinMask 300 tool for mask cleaning, etching and resist strip.

Technical description

  • Substrate size up to 200mm
  • Photomask size from 2,5”x2,5” to 9”x9”
  • Removal of organic contamination from the substrate surface (SPM dispense system)
  • Fast and effective removal of particles (micrometer size and above)
  • Removal of submicron particles from the substrate Surface (Megasonic System)

Application

  • Photomask cleaning
  • Photomask etching
  • Photomask resist stripping
  • Wafer cleaning

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